PRODUCT

Cuprum promise to always do our best.

Cu Echant

Cuprum's Cu etchant solution is formulated for precise, anisotropic etching of copper in advanced semiconductor packaging processes.

 The proprietary additive forms a stable protective complex on the Cu sidewalls, suppressing lateral dissolution and enabling clean, well-defined etch profiles.



Key Features
✔ Anisotropic (Sidewall-Selective) Etching
✔ Strong Chemisorption on Cu Surface
✔ Stable Cu-Additive Complex Layer
✔ Suppressed Sidewall Dissolution
✔ High-Precision, Reproducible Etch Profiles

Mechanism

The surface coverage (θ) on the copper increases with the additive concentration.


The adsorption free energy (ΔG_ads^∘) is lower (more negative) than -40 kJ/mole.

(The formula in the graph shows a value of around -68.64 kJ/mol.)


=> Strong chemisorption rather than simple physical adsorption

<XSP Without additive>

<XSP With additive>

  • Significant increase in the green peak upon adding the additive.
  • Proves the formation of a stable complex layer on Cu sidewalls.
  • Prevents Cu dissolution, enabling successful anisotropic etching.

Result

Ultimately, Cuprum's etchant demonstrated an outstanding etch factor of over 53.

OM Image

(x200)

Company A additive

Cuprum Additive 1

Cuprum Additive 2

E/F

24.97

12.55

33

Conditions

Agitation Rate

Temperature

Thickness

Pattern Size

Sample Information

2500rpm

50℃

20㎛

50x5

YMT